RF-sputtered thin film gas sensors based on modified tin dioxide

Electron Technology (Warsaw)

Volumn 33, Issue 1, 2000, Pages 73-78

  Radecka, M ^a   Pasierb, P ^a   Zakrzewska, K ^a   Kowal, A ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; CHEMICAL MODIFICATION; COMPOSITION EFFECTS; CRYSTALLIZATION; SEMICONDUCTING FILMS; SEMICONDUCTING TIN COMPOUNDS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILM DEVICES; TITANIUM; TUNGSTEN;

RADIOFREQUENCY REACTIVE SPUTTERING; SEMICONDUCTOR GAS SENSORS; THIN FILM SENSORS; TIN DIOXIDE;

CHEMICAL SENSORS;

EID: 0033740762     PISSN: 00709816     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)