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Volumn 44, Issue 6, 2000, Pages 969-976

Device parameters extracted in the linear region of MOSFET by comparing with the exact gradual channel model

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; PARAMETER ESTIMATION; SEMICONDUCTOR DEVICE MODELS;

EID: 0033737396     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(00)00017-4     Document Type: Article
Times cited : (6)

References (13)
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    • Terada, K.1    Muta, H.2
  • 2
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    • Measurement of threshold voltage and channel length of submicron MOSFETs
    • Jain S. Measurement of threshold voltage and channel length of submicron MOSFETs. IEE Proc. 135:1988;162.
    • (1988) IEE Proc , vol.135 , pp. 162
    • Jain, S.1
  • 3
    • 0031233839 scopus 로고    scopus 로고
    • Device parameter extraction in the linear region of MOSFET's
    • Katto H. Device parameter extraction in the linear region of MOSFET's. IEEE Electron Dev Lett. 18:1997;408.
    • (1997) IEEE Electron Dev Lett , vol.18 , pp. 408
    • Katto, H.1
  • 5
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    • Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors
    • Pao H.C., Sah C.T. Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors. Solid State Electron. 9:1966;927.
    • (1966) Solid State Electron , vol.9 , pp. 927
    • Pao, H.C.1    Sah, C.T.2
  • 6
    • 0016349380 scopus 로고
    • Analytical expressions for the static MOS transistor characteristics based on the gradual channel model
    • Katto H., Ito Y. Analytical expressions for the static MOS transistor characteristics based on the gradual channel model. Solid State Electron. 17:1974;1283.
    • (1974) Solid State Electron , vol.17 , pp. 1283
    • Katto, H.1    Ito, Y.2
  • 8
    • 0020186076 scopus 로고
    • Charge accumulation and mobility in thin dielectric MOS transistors
    • Sodini C.G., Ekstedt T.W., Moll J.L. Charge accumulation and mobility in thin dielectric MOS transistors. Solid State Electron. 25:1982;833.
    • (1982) Solid State Electron , vol.25 , pp. 833
    • Sodini, C.G.1    Ekstedt, T.W.2    Moll, J.L.3
  • 9
    • 0019057709 scopus 로고
    • Experimental derivation of the source and drain resistance of MOS transistors
    • Suciu P.L., Johnston R.L. Experimental derivation of the source and drain resistance of MOS transistors. IEEE Trans Electron Dev. ED-27:1980;1846.
    • (1980) IEEE Trans Electron Dev , vol.27 , pp. 1846
    • Suciu, P.L.1    Johnston, R.L.2
  • 10
    • 0038428181 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • Sun S.C., Plummer J.D. Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces. IEEE J Solid State Circuits. SC-15:1980;562.
    • (1980) IEEE J Solid State Circuits , vol.15 , pp. 562
    • Sun, S.C.1    Plummer, J.D.2
  • 12
    • 0030151891 scopus 로고    scopus 로고
    • The impact of device scaling and power supply change on CMOS gate performance
    • Chen K., Wann H.C., Ko P.K., Hu C. The impact of device scaling and power supply change on CMOS gate performance. IEEE Electron Dev Lett. 17:1996;202.
    • (1996) IEEE Electron Dev Lett , vol.17 , pp. 202
    • Chen, K.1    Wann, H.C.2    Ko, P.K.3    Hu, C.4
  • 13
    • 0013456857 scopus 로고
    • Effective carrier mobility in surface-space charge layers
    • Schrieffer J.R. Effective carrier mobility in surface-space charge layers. Phys Rev. 97:1955;641.
    • (1955) Phys Rev , vol.97 , pp. 641
    • Schrieffer, J.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.