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Volumn 566, Issue , 1999, Pages 181-186
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Hydrodynamics of a chemical-mechanical planarization process
a b b a |
Author keywords
[No Author keywords available]
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Indexed keywords
FLOW OF FLUIDS;
HYDRODYNAMICS;
MATHEMATICAL MODELS;
MICROELECTRONIC PROCESSING;
SLURRIES;
STRESS CONCENTRATION;
CHEMICAL MECHANICAL PLANARIZATION;
THREE DIMENSIONAL FLOW;
WAFER SCALE MODEL;
CHEMICAL POLISHING;
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EID: 0033737269
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-566-181 Document Type: Article |
Times cited : (6)
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References (7)
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