Correlation between the infrared reflectance and microstructure of thin gallium nitride films grown on silicon substrates

Solid State Communications

Volumn 115, Issue 1, 2000, Pages 45-49

  Hou, Y T ^a   Feng, Z C ^b   Chen, J ^a   Zhang, X ^a   Chua, S J ^a,b   Lin, J Y ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; FILM GROWTH; LIGHT ABSORPTION; LIGHT REFLECTION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS;

GALLIUM NITRIDE; INFRARED REFLECTANCE (IR) SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0033735083     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(00)00134-4     Document Type: Article

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