Charge pumping technique for the evaluation of plasma induced edge damage in shallow S/D extension thin gate oxide NMOSFET's

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 2000, Pages 389-393

  Chung, Steve S ^a   Chen, S J ^a   Kao, H L ^a   Luo, S J ^a   Lin, H C ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); HOT CARRIERS; PLASMA ETCHING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

CHARGE PUMPING; PLASMA INDUCED EDGE DAMAGE;

MOSFET DEVICES;

EID: 0033733052     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)