Characteristics of interface-modified Josephson junctions fabricated under various etching conditions

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 4 A, 2000, Pages

  Horibe, Masahiro ^a   Inagaki, Yukitoshi ^a   Yoshida, Kazuhiro ^a   Matsuda, Gen ichiro ^a   Hayashi, Noriyoshi ^a   Fujimaki, Akira ^a   Hayakawa, Hisao ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRON CYCLOTRON RESONANCE; HIGH TEMPERATURE SUPERCONDUCTORS; INTERFACES (MATERIALS); OXIDE SUPERCONDUCTORS; PLASMA ETCHING; SUPERCONDUCTIVITY; VACUUM APPLICATIONS; YTTRIUM BARIUM COPPER OXIDES;

INTERFACE-MODIFIED JUNCTIONS (IMJ);

JOSEPHSON JUNCTION DEVICES;

EID: 0033732507     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l284     Document Type: Article

References (14)