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Volumn 28, Issue 1, 2000, Pages 278-287

Modeling and diagnostic of an SF6 RF plasma at low pressure

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; ELECTROSTATIC DEVICES; NEGATIVE IONS; NUCLEAR REACTORS; PHOTODIODES; REACTION KINETICS; SULFUR COMPOUNDS; TRANSPORT PROPERTIES;

EID: 0033730798     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.842923     Document Type: Article
Times cited : (48)

References (39)
  • 20
    • 0003545273 scopus 로고    scopus 로고
    • O. Auciello, A. Gras-Marti, J. A. Valles-Abarca, and D. L. Flamm, Eds. Dordrecht, the Netherlands: Kluwer Academic, 1990.
    • V. A. Godyak, Plasma Surface Interactions and Processing of Materials, O. Auciello, A. Gras-Marti, J. A. Valles-Abarca, and D. L. Flamm, Eds. Dordrecht, the Netherlands: Kluwer Academic, 1990.
    • Plasma Surface Interactions and Processing of Materials
    • Godyak, V.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.