Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400-1650 °C range

Journal of Materials Science Letters

Volumn 19, Issue 11, 2000, Pages 1007-1010

  Testu, S ^a   Besson, J L ^a   Rouxel, T ^b   Bernard Granger, G ^c  

^a Ecole Nationale Superieure de Ceramique Industrielle   (France)

^b CNRS   (France)

^c Ceramiques Techniques DESMARQUEST   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CERAMIC MATERIALS; COMPUTATIONAL METHODS; DUCTILITY; ELASTIC MODULI; GLASS TRANSITION; HIGH TEMPERATURE EFFECTS; RESIDUAL STRESSES; SINTERING; STRESS ANALYSIS; STRESS RELAXATION; VISCOSITY;

RELAXATION TIME CONSTANT;

SILICON NITRIDE;

EID: 0033728408     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006749129216     Document Type: Article

References (13)

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