Preliminary results at the ultra deep X-ray lithography beamline at CAMD

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4019, Issue , 2000, Pages 429-435

  Aigeldinger, Georg ^a   Coane, Phil ^a   Craft, Ben ^a   Goettert, Jost ^a   Ledger, Sam ^a   Ling, Zhong Geng ^a   Manohara, Harish ^a   Rupp, Louis ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; GRAPHITE; MAGNETIC LENSES; MASKS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SUPERCONDUCTING DEVICES; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

SUPERCONDUCTING WIGGLERS; X RAY MASKS;

MICROMACHINING;

EID: 0033726137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)