NO/O2/NO plasma grown oxynitride films on silicon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3975, Issue , 2000, Pages

  Maikap, S ^a   Ray, S K ^a   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; NITROGEN OXIDES; OXYGEN; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SEMICONDUCTOR PLASMAS; ULTRATHIN FILMS;

FOWLER-NORDHEIM CONSTANT CURRENT STRESSING;

SEMICONDUCTING FILMS;

EID: 0033726115     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)