Overlay budget considerations for an all scanner fab

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Seltmann, Rolf ^a   Demmerle, Wolfgang ^a   Staples, Marc ^a   Minvielle, Anna Maria ^a   Schulz, Bernd ^a   Muehle, Sven ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; OPTICAL INSTRUMENT LENSES;

CHEMICAL MECHANICAL POLISHING (CMP); SHALLOW TRENCH ISOLATION (STI);

SCANNING;

EID: 0033725655     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)