Investigation of low-energy carbon cluster depositions on surfaces by a molecular dynamics simulation

Surface and Coatings Technology

Volumn 128-129, Issue 1, 2000, Pages 76-80

  Pan, Zhengying ^a,b   Zhu, Wenjun ^a   Man, Zhenyong ^a   Xu, Yi ^a   Ho, Yukun ^a  

^a FUDAN UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Carbon; Chemical vapor deposition; Cluster; Silicon

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; FULLERENES; INDUSTRIAL DIAMONDS; MOLECULAR DYNAMICS; SILICON;

LOW-ENERGY CARBON CLUSTER;

CHEMICAL VAPOR DEPOSITION;

EID: 0033722746     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00661-7     Document Type: Article

References (16)

1. A. Perez, P. Melinon, V. Dupuis et al., J. Phys. D 30 (1997) 709.
2. P. Melinon, V. Paillard, V. Dupuis et al., Int. J. Mod. Phys. B9 (1995) 339.
3. V. Paillard, P. Melinon, V. Dupuis et al., Phys. Rev. B49 (1994) 11433.
4. C.Z. Wang, K.M. Ho, Phys. Rev. Lett. 71 (1993) 1184.
5. P. Jensen, A.-L. Barabasi, H. Larralde, S. Havlinand, H.E. Stanley, Nature 368 (1994) 22.
6. V. Parasuk, J. Almlof, Chem. Phys. Lett. 184 (1991) 187.
7. T. Guo, M.D. Diener, Y. Chai et al., Science 257 (1992) 1661.
8. J. Tersoff, Phys. Rev. B39 (1989) 5566.
9. D.B. Brenner, Phys. Rev. B42 (1990) 9458.
10. A. Conning, G. Galli, J. Kim, Phys. Rev. Lett. 78 (1997) 4442.
11. Z.Y. Man, Z.Y. Pan, Y.K. Ho, W.J. Zhu, Eur. Phys. J. D. (accepted for publication).
12. Z.Y. Man, Z.Y. Pan, Y.K. Ho, W.J. Zhu, Nucl. Instrum. Methods B153 (1999) 280.
13. D. Klyachko, D.M. Chen, Phys. Rev. Lett. 75 (1995) 3693.
14. T. Hashizume, X.D. Wang, Y. Nishina et al., Jpn. J. Appl. Phys. 31 (1992) L880.
15. A. Conning, G. Galli, J. Kim, Phys. Rev. Lett. 78 (1997) 4442.
16. R.W. Lee, Z.Y. Pan, Y.K. Ho, Phys. Rev. B53 (1996) 4156.