Thermal analysis on the amorphous carbon nitride prepared by reactive magnetron sputtering

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 5 A, 2000, Pages

  Xiao, Xing Cheng ^a   Jiang, Wei Hui ^a   Song, Li Xin ^a   Hu, Xing Fang ^a   Lu, Chang Wei ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DIFFERENTIAL THERMAL ANALYSIS; EVAPORATION; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITRIDES; OXIDATION; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; REACTIVE MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0033722133     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l420     Document Type: Article

References (11)