Environmental stability of chemically amplified resists: Proposing an industry standard methodology for testing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (I), Issue , 2000, Pages 284-293

  Dean, Kim ^a   Kishkovich, Oleg ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; AMMONIA; CONTAMINATION; ETHANOL; STANDARDS;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0033721804     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388295     Document Type: Conference Paper

References (14)