Fabrication of a three-axis accelerometer integrated with commercial 0.8 μm-CMOS circuits

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2000, Pages 781-786

  Takao, Hidekuni ^a   Fukumoto, Hirofumi ^a   Ishida, Makoto ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHEMICAL POLISHING; CMOS INTEGRATED CIRCUITS; DEPOSITION; ETCHING; MASKS; MICROMACHINING; SILICA; SILICON WAFERS;

BULK MICROMACHINED THREE-AXIS ACCELEROMETERS; PHYSICAL VAPOR DEPOSITION (PVD);

ACCELEROMETERS;

EID: 0033721561     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)