Production of photoluminescent Si-based nanostructures by laser ablation: Effects of the ablation and post-deposition conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3933, Issue , 2000, Pages 192-199

  Kabashin, A V ^a   Charbonneau Lefort, M ^a   Meunier, M ^a   Leonelli, R ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DEPOSITION; EVAPORATION; LASER ABLATION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICA; THERMOOXIDATION;

NANOPARTICLES; PULSED LASER DEPOSITION (PLD);

PULSED LASER APPLICATIONS;

EID: 0033721291     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.387555     Document Type: Conference Paper

References (21)