Atomistic modeling of void growth and coalescence in Ni+H

Materials Research Society Symposium - Proceedings

Volumn 578, Issue , 2000, Pages 333-338

  Somerday, B P ^a   Pattillo II, P D ^b   Horstemeyer, M F ^a   Baskes, M I ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COALESCENCE; COMPUTER SIMULATION; CRACK PROPAGATION; DISLOCATIONS (CRYSTALS); MATHEMATICAL MODELS; MOLECULAR DYNAMICS; NICKEL; NUCLEATION; PRESSURE EFFECTS;

ATOMISTIC MODELING; EMBEDDED ATOM METHOD; FINITE STRAIN RATE ATOMISTIC SIMULATIONS; VOID GROWTH;

CRYSTAL LATTICES;

EID: 0033720826     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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