Solvent content of thick photoresist films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Lehar, Octavia P ^a   Sagan, John P ^a   Zhang, Lizhong ^a   Dammel, Ralph R ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DISSOLUTION; DRYING; FUEL ADDITIVES; GAS CHROMATOGRAPHY; OPTICAL PROPERTIES; REACTION KINETICS; SOLVENTS; THICK FILMS; VISCOSITY;

SOLVENT RETENTION;

PHOTORESISTS;

EID: 0033720208     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)