Dendrimer-based chemically amplified resists for sub-100 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Tully, David C ^a   Trimble, Alexander R ^a   Frechet, Jean M J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ESTERIFICATION; MONOMERS; POLYESTERS; POLYETHERS; SYNTHESIS (CHEMICAL);

BROMINATION; CHEMICAL AMPLIFICATION; DENDRIMERS; ETHERIFICATION; POLYBENZYL ESTER; POLYBENZYL ETHER;

PHOTORESISTS;

EID: 0033720203     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)