Sputtering highly c-axis-oriented AlN films on Y-128° LiNbO3

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 6 A, 2000, Pages

  Wu, Long ^a   Chen, Ping Chen ^a   Wu, Sean ^a   Song, Hong Tie ^a   Chure, Ming Cherng ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b FAR EAST UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; LITHIUM NIOBATE; MAGNETRON SPUTTERING; MORPHOLOGY; PRESSURE EFFECTS; SPUTTER DEPOSITION;

ALUMINUM NITRIDE; MICROMORPHOLOGY;

DIELECTRIC FILMS;

EID: 0033719539     PISSN: 00214922     EISSN: None     Source Type: None    
DOI: 10.1143/jjap.39.l545     Document Type: Article

References (10)