Mechanism of a single layer 193 nm dissolution inhibition resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Yan, Zhenglin ^a   Houlihan, Francis M ^a   Reichmanis, Elsa ^a   Nalamasu, Omkaram ^a   Reiser, Arnost ^a   Dabbagh, Gary ^a   Hutton, Richard S ^a   Osei, Dan ^a   Sousa, Jose ^a   Bolan, Kevin J ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; DISSOLUTION; HYDROPHOBICITY; PERCOLATION (SOLID STATE); POLYOLEFINS;

CYCLOOLEFIN POLYMERS; DISSOLUTION INHIBITORS; QUICK SCREENING METHOD;

PHOTORESISTS;

EID: 0033719341     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)