Novel method for fabricating CD reference materials with 100 nm linewidths

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 2000, Pages 21-24

  Allen, Richard A ^a   Linholm, Loren W ^a   Cresswell, Michael W ^a   Ellenwood, Colleen H ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ELECTRIC VARIABLES MEASUREMENT; ETCHING; MASKS; POTASSIUM COMPOUNDS; SEMICONDUCTING FILMS; SILICON WAFERS; SINGLE CRYSTALS;

CRITICAL DIMENSION REFERENCE MATERIALS; SINGLE CRYSTAL SILICON ON INSULATOR FILMS; WET ETCHING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033719288     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)