Analysis of laser ablation process in semiconductor due to ultrashort pulsed laser with molecular dynamics simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3933, Issue , 2000, Pages 46-55

  Watanabe, Koji ^a   Ishizaka, Yuri ^a   Ohmura, Etsuji ^a   Miyamoto, Isamu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL ORIENTATION; EVAPORATION; MOLECULAR DYNAMICS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; ULTRAFAST PHENOMENA;

ULTRASHORT LASERS;

LASER ABLATION;

EID: 0033718725     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.387594     Document Type: Conference Paper

References (10)