Spectroscopic ellipsometry of oxides and interfaces thermally formed on (100)Si and (111)Si

Surface Science

Volumn 454, Issue 1, 2000, Pages 402-406

  Szekeres, A ^a   Paneva, A ^b   Alexandrova, S ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; ELLIPSOMETRY; HYDROGEN; MORPHOLOGY; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; SURFACE ROUGHNESS; THERMOOXIDATION;

SPECTROSCOPIC ELLIPSOMETRY;

PHASE INTERFACES;

EID: 0033717915     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00185-0     Document Type: Article

References (18)

1. Katz L.E. Slaughter T.M., Eichberg M. VLSI Technology. 1987;131-167 McGraw-Hill, New York. Chapter 4.
2. Angermann H., Henrion W., Rebien M., Fischer D., Zettler J.-T., Röseler A. Thin Solid Films. 313/314:1998;552.
3. Wang Y., Shi M., Rabalais J.W. Phys. Rev. B. 48:1993;1678, 1689.
4. Alexandrova S., Szekeres A. Thin Solid Films. 343/344:1999;385.
5. Bu-Abbud G.H., Bashara N.M., Woollam J.A. Thin Solid Films. 138:1986;27.
6. Azzam R.M.A., Bashara N.M. Ellipsometry and Polarized Light. 1977;North-Holland, Amsterdam.
7. Aspnes D.E., Theeten J.B. J. Electrochem. Soc. 127:1980;1359. and references cited therein.
8. Aspnes D.E., Studna A.A. Phys. Rev. B. 27:1983;985.
9. Jellison G.E. Jr. Opt. Mater. 1:1992;41.
10. Malitson I.H. J. Opt. Soc. Am. 55:1965;1205.
11. Ho J.H., Lee C.L., Jen C.W., Lei T.F. Solid State Electron. 30:1987;973.
12. Jellison G.E. Jr. J. Appl. Phys. 69:1991;7627.
13. Miyata N., Watanabe H., Ichikawa M. Phys. Rev. B. 58:1998;13 670.
14. Szekeres A. Radiat. Effect. Expr. 1:1988;233.
15. Szekeres A., Simeonov S.S., Kafedjiiska E. Semicond. Sci. Technol. 9:1994;1795.
16. Sofield C.J., Stoneham A.M. Semicond. Sci. Technol. 10:1995;215.
17. Capaz R.B., Assali L.V.C., Kimerlimg L.C., Cho K., Joannopoulos J.D. Phys. Rev. B. 59:1999;4898.
18. Dawson J.L., Krisch K., Evans-Lutterodt K.W., Tang M.-T., Manchanda L., Green M.L., Brasen D., Higashi G.S., Boone T. J. Appl. Phys. 77:1995;4746.