Exposure latitude analysis for dense line and space patterns by using diffused aerial image model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Ahn, Chang Nam ^a   Kim, Hee Bom ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE BACKSCATTERING; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR CORRECTION; IMAGE ANALYSIS; IMAGE QUALITY; LIGHTING; MASKS; X RAY LITHOGRAPHY;

CHEMICAL AMPLIFICATION RESISTS (CAR); DIFFUSED AERIAL IMAGE MODELS; MASK ERROR EFFECTS;

PHOTORESISTS;

EID: 0033717843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)