Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 74-78

  Bulkin, Pavel V ^a  

^a UNIVERSITY OF JOHANNESBURG   (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; MICROWAVE GENERATION; OPTICAL FIBERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS;

DIELECTRIC THIN FILMS; GAS FLOW RATE; MICROWAVE POWER; RADIO FREQUENCY SUBSTRATE BIAS; RUGATE FILTERS;

OPTICAL FILTERS;

EID: 0033717686     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582120     Document Type: Article

References (2)

1. Handbook of Thin-Film Deposition Processes and Techniques, edited by K. K. Schuegraf (Noyes Publications, NJ, 1988), pp. 147-169.
2. Microwave Excited Plasmas, edited by M. Moisan and J. Pelletier (Elsevier, Amsterdam, 1992), pp. 473-490.