Diamond growth on polycrystalline nickel silicides

Journal of Crystal Growth

Volumn 216, Issue 1, 2000, Pages 225-234

  Rey, S ^a   Hommet, J ^a   Schmerber, G ^a   Le Normand, F ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; EPITAXIAL GROWTH; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL); X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

NICKEL SILICIDE;

NICKEL COMPOUNDS;

EID: 0033717679     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00365-1     Document Type: Article

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