Slip-free rapid thermal processing in single wafer furnace

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 6 A, 2000, Pages

  Yoo, Woo Sik ^a   Fukada, Takashi ^a   Kitayama, Hirofumi ^b   Takahashi, Nobuaki ^b   Enjoji, Keiichi ^b   Sunohara, Kiyoshi ^b  

^a WaferMasters Inc   (United States)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTAL DEFECTS; HEAT TREATMENT; OPTICAL MICROSCOPY; THERMAL EFFECTS; X RAY ANALYSIS;

RAPID THERMAL PROCESSING (RTP); SINGLE WAFER FURNACES (SWF); X RAY TOPOGRAPHY;

SILICON WAFERS;

EID: 0033717471     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l493     Document Type: Article

References (7)