Comparison of quantum Hall effect resistance standards of the NIST and the BIPM

Metrologia

Volumn 37, Issue 2, 2000, Pages 173-176

  Delahaye, F ^a   Witt, T J ^a   Elmquist, R E ^b   Dziuba, R F ^b  

^a PAVILLON DE BRETEUIL   (France)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

QUANTUM HALL EFFECT; STANDARD UNCERTAINTY; VON KLITZING CONSTANT;

ELECTRIC RESISTANCE MEASUREMENT; STANDARDS;

HALL EFFECT;

EID: 0033717403     PISSN: 00261394     EISSN: None     Source Type: Journal    
DOI: 10.1088/0026-1394/37/2/10     Document Type: Article

References (7)

1. Delahaye F., Witt T. J., Piquemal F., Genevès G., IEEE Trans. Instrum. Meas., 1995, 44, 258-261.
2. Delahaye F., Witt T. J., Jeckelmann B., Jeanneret B., Metrologia, 1995/96, 32, 385-388.
3. Delahaye F., Witt T. J., Pesel E., Schumacher B., Warnecke P., Metrologia, 1997, 34, 211-214.
4. Delahaye F., Bournaud D., IEEE Trans. Instrum. Meas., 1991, 40, 237-240.
5. Piquemal F., Genevès G., Delahaye F., André J. P., Patillon J. N., Frijlink P., IEEE Trans. Instrum. Meas., 1993, 42, 264-268.
6. Elmquist R., Dziuba F., Rev. Sci. Instrum., 1991, 62, 2457-2460.
7. Delahaye F., Bournaud D., IEEE Trans. Instrum. Meas., 1993, 42, 287-291.