First principles study of atomic-scale Al2O3 films as insulators for magnetic tunnel junctions

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 5 B, 2000, Pages

  Watari, Noriko ^a   Saito, Mineo ^a   Tsuge, Hisanao ^a   Sugino, Osamu ^a   Ohnishi, Shuhei ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ELECTRIC INSULATING MATERIALS; ENERGY GAP; MAGNETIC DEVICES; MAGNETORESISTANCE; MATHEMATICAL MODELS; PROBABILITY DENSITY FUNCTION; THIN FILMS; TUNNEL JUNCTIONS;

LOCAL DENSITY APPROXIMATION; MAGNETIC TUNNEL JUNCTIONS;

ALUMINA;

EID: 0033717272     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l479     Document Type: Article

References (19)