Micromechanical silicon precision scale

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4019, Issue , 2000, Pages 498-505

  Oja, A ^a   Sillanpaa, T ^a   Seppa, H ^a   Kiihamaki, J ^a   Seppala, P ^a   Karttunen, J ^a   Riski, K ^a  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ELECTROSTATIC DEVICES; METALLIZING; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON ON INSULATOR TECHNOLOGY;

DEEP REACTIVE ION ETCHING; PRECISION WEIGHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0033717168     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)