ZnO/Zn phosphor thin films prepared by IBED

Surface and Coatings Technology

Volumn 128-129, Issue 1, 2000, Pages 346-350

  Li, W ^a   Mao, D S ^a   Zheng, Z H ^a   Wang, X ^a   Liu, X H ^a   Zou, S C ^a   Zhu, Y K ^b   Li, Q ^b   Xu, J F ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

IBED; Phosphor thin films; Photoluminescence; ZnO Zn

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; DEPOSITION; EVAPORATION; FILM PREPARATION; ION BOMBARDMENT; PHOTOLUMINESCENCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ION BEAM ENHANCED DEPOSITION;

PHOSPHORS;

EID: 0033716808     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00609-5     Document Type: Article

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