Initial stages of NH3 adsorption on Si(111)7×7

Surface Science

Volumn 454, Issue 1, 2000, Pages 358-362

  Ezzehar, H ^a   Sonnet, Ph ^a   Minot, C ^b   Stauffer, L ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

^b LABORATOIRE DE CHIMIE THÉORIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATOMS; CHEMICAL BONDS; CHEMISORPTION; DISSOCIATION; MATHEMATICAL MODELS; MORPHOLOGY; SILICON; SURFACE PHENOMENA; SURFACE ROUGHNESS;

ADATOMS;

ADSORPTION;

EID: 0033716524     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00161-8     Document Type: Article

References (12)

1. Wolkow R., Avouris Ph. Phys. Rev. Lett. 60:1988;1049.
2. Chen P.J., Colaianni M.L., Yates J.T. Jr. Surf. Sci. 274:1992;605.
3. Bozso F., Avouris Ph. Phys. Rev. B. 38:1988;3937.
4. Zaïbi M.-A., Lacharme J.-P., Sébenne C.A. Surf. Sci. 206-210:1998;402.
5. Dufour G., Rochet F., Roulet H., Sirotti F. Surf. Sci. 304:1994;33.
6. Kubler L., Bischoff J.L., Bolmont D. Phys. Rev. B. 38:1998;13 113.
7. Björkqvist M., Göthelid M., Grehk T.M., Karlsson U.O. Phys. Rev. B. 57:1998;2327.
8. Ezzehar H., Stauffer L., Leconte J., Minot C. Surf. Sci. 388:1997;220.
9. Stauffer L., Van S., Bolmont D., Koulmann J.J., Minot C. Solid State Commun. 85:1993;937.
10. Tong S.Y., Huang H., Wei C.M., Packard W.E., Men F.K., Glander G., Webb M.B. J. Vac. Sci. Technol. A. 6:1988;615.
11. Stauffer L., Minot C. Catal. Lett. 23:1994;1.
12. Hoffmann R. J. Chem. Phys. 39:1963;1397.