Optical and microstructural characterization of nanocrystalline silicon superlattices

Materials Research Society Symposium - Proceedings

Volumn 588, Issue , 2000, Pages 173-185

  Tsybeskov, L ^a   Grom, G F ^a   Krishnan, R ^a   Fauchet, P M ^a   McCaffrey, J P ^b   Baribeau, J M ^b   Sproule, G I ^b   Lockwood, D J ^b   Timoshenko, V ^c   Diener, J ^c   Heckler, H ^c   Kovalev, D ^c   Koch, F ^c   Blanton, T N ^d  

^a University of Rochester   (United States)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^d EASTMAN KODAK COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PHONONS; PHOTOLUMINESCENCE; RAMAN SCATTERING; SILICON; SPECTROSCOPY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

AUGER ELEMENTAL MICROANALYSIS; NANOCRYSTALLINE SILICON SUPERLATTICES; QUASI EQUILIBRIUM ANNEALING; X RAY SMALL ANGLE REFLECTION;

SUPERLATTICES;

EID: 0033716487     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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