IDEAL double exposure method for poly-level structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 240-251

  Romeo, Carmelo ^a   Canestrari, Paolo ^a   Fiorino, Antonio ^a   Hasegawa, Masanobu ^a   Saitoh, Kenji ^a   Suzuki, Akiyoshi ^a  

^a STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; SILICON NITRIDE; SILICON WAFERS;

INNOVATIVE DOUBLE EXPOSURE BY ADVANCED LITHOGRAPHY (IDEAL); PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033716189     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389013     Document Type: Conference Paper

References (8)