Effect of sputtering input power on structural inhomogeneities in as-sputtered Fe-Hf-N thin films

Journal of Magnetism and Magnetic Materials

Volumn 215, Issue , 2000, Pages 368-371

  Kim, K H ^a,c   Kim, Y H ^a   Kim, J ^b   Han, S H ^c   Kim, H J ^c  

^a Myong Ji University   (South Korea)

^b Hanyang University   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON SPECTROSCOPY; FERROMAGNETIC RESONANCE; IRON COMPOUNDS; MAGNETIC ANISOTROPY; MAGNETIC PERMEABILITY; MAGNETRON SPUTTERING; NUMERICAL METHODS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; IRON HAFNIUM NITROGEN COMPOUNDS; SPUTTERING INPUT POWER;

MAGNETIC THIN FILMS;

EID: 0033715864     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)00161-X     Document Type: Article

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