Optical characterization and process control of top surface imaging

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 183-188

  Luo, Ying Ying ^a   Stauffer, Craig ^a   Ygartua, Carlos ^a   Chu, Dinh ^a   Hayzelden, Clive ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ELECTRON BEAM LITHOGRAPHY; IMAGING TECHNIQUES; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; SURFACE PHENOMENA; SWELLING; THICKNESS MEASUREMENT;

DEEP ULTRAVIOLET ILLUMINATION; SILYLATION; SURFACE IMAGING;

ELLIPSOMETRY;

EID: 0033709951     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/PROC-584-183     Document Type: Article

References (0)