Integrated micro-electrophoretic chip fabricated using a new stereolithographic process

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2000, Pages 751-756

  Mizukami, Yoshiaki ^a   Rajniak, Daniel ^a   Nishimura, Masatoshi ^a  

^a DAIICHI SANKYO CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONICS PACKAGING; INTEGRATED CIRCUIT MANUFACTURE; LIGHT ABSORPTION; LITHOGRAPHY; OPTICAL SENSORS;

INTEGRATED MICROELECTROPHORETIC CHIPS;

MICROPROCESSOR CHIPS;

EID: 0033708593     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)