Application of photodecomposable base concept to 193 nm resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Padmanaban, Munirathna ^a   Bae, Jun Bom ^a   Cook, Michelle ^a   Kim, Woo Kyu ^a   Klauck Jacobs, Axel ^a   Kudo, Takanori ^a   Rahman, M Dalil ^a   Dammel, Ralph R ^a   Byers, Jeffrey D ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; COMPOSITION EFFECTS; PHOTOLYSIS; SULFUR COMPOUNDS;

TRIMETHYL SULFONIUM HYDROXIDE;

PHOTORESISTS;

EID: 0033708519     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)