0.12 micron logic process using a 248 nm step-and-scan system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Baker, Dan ^a   Zheng, Tammy ^a   Takemoto, Cliff ^a   Sethi, Satyendra ^a   Gabriel, Calvin ^a   Scott, Greg ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ETCHING; LOGIC GATES; MICROELECTRONIC PROCESSING; SILICON NITRIDE; SURFACE ROUGHNESS;

STEP-AND-SCAN SYSTEM;

PHOTORESISTS;

EID: 0033708360     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)