High aspect-ratio dry-release poly-silicon MEMS technology for inertial-grade microgyroscopes

Record - IEEE PLANS, Position Location and Navigation Symposium

Volumn , Issue , 2000, Pages 304-308

  Ayazi, Farrokh ^a   Najafi, Khalil ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRODES; GYROSCOPES; MICROMACHINING; REACTIVE ION ETCHING; SILICON WAFERS; VIBRATIONS (MECHANICAL);

CORIOLIS ACCELERATION; DEEP TRENCH ETCHING; VIBRATORY MICROGYROSCOPES;

MICROELECTROMECHANICAL DEVICES;

EID: 0033708079     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)