Properties of image sensor structure obtained below 120°C on the foil by reactive magnetron sputtering

Materials Research Society Symposium - Proceedings

Volumn 558, Issue , 2000, Pages 243-248

  Kolodziej, A ^a   Krewniak, P ^a   Tadeusiewicz, R ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; PHOTODIODES; POLYIMIDES; REFRACTIVE INDEX; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

INFRARED ABSORPTION; OPTOELECTRICAL MEASUREMENTS; SMALL ANGLE X RAY DIFFRACTION;

IMAGE SENSORS;

EID: 0033707887     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)