SCREAM micromachined high aspect ratio low-G microaccelerometer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4019, Issue , 2000, Pages 344-353

  Tay, Francis E H ^a   Logeeswaran, V J ^a   Liang, Y C ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELEROMETERS; ASPECT RATIO; CAPACITANCE; COST EFFECTIVENESS; ELECTRIC POTENTIAL; ELECTROSTATIC ACCELERATORS; FINITE ELEMENT METHOD; METALLIZING; MICROMACHINING; MICROSENSORS; MULTICHIP MODULES; REACTIVE ION ETCHING;

CAPACITIVE MICROACCELEROMETERS; ELECTROSTATIC SPRING CONSTANT; SINGLE CRYSTAL REACTIVE ION ETCHING AND METALLIZATION (SCREAM);

MICROELECTROMECHANICAL DEVICES;

EID: 0033707664     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)