Mechanical property of organic resists for ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 992-999

  Morisawa, Taku ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRACK INITIATION; SILICON WAFERS; STRENGTH OF MATERIALS; STRESS ANALYSIS; SUBSTRATES;

ORGANIC RESISTS;

PHOTORESISTS;

EID: 0033707410     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388262     Document Type: Conference Paper

References (5)