Characterization of electrical linewidth test structures patterned in (100) silicon-on-insulator for use as CD standards

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 2000, Pages 3-9

  Cresswell, M W ^a   Allen, R A ^a   Ghoshtagore, R N ^a   Guillaume, N M P ^a   Shea, P J ^a   Everist, S C ^a   Linholm, L W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ELECTRIC VARIABLES MEASUREMENT; EQUIPMENT TESTING; IMAGE PROCESSING; MICROMACHINING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SILICON ON INSULATOR TECHNOLOGY;

BONDED AND ETCHED BACK SILICON ON INSULATOR MATERIAL; CRITICAL DIMENSION; ELECTRICAL LINEWIDTH TEST STRUCTURE;

RESISTORS;

EID: 0033706677     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)