Unveiling the composition of sulfur sensitization specks by their interaction with TAI

Journal of Imaging Science and Technology

Volumn 44, Issue 3, 2000, Pages 235-241

  Charlier, E ^a   Van Doorselaer, M ^b   Gijbels, R ^a   De Keyzer, R ^b   Geuens, I ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b AGFA GEVAERT N V   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPOSITION; DEPOSITION; DESORPTION; DIELECTRIC LOSSES; PH EFFECTS; PHOTOSENSITIVITY; PHOTOSENSITIZERS; SENSITOMETERS; SILVER COMPOUNDS; SPECTROSCOPIC ANALYSIS; SULFUR;

DIFFUSE REFLECTANCE SPECTROSCOPY; HYDROXYTETRAAZAINDENE; SILVER HALIDE; SULFUR SENSITIZATION;

PHOTOGRAPHIC EMULSIONS;

EID: 0033706542     PISSN: 10623701     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (30)

1. J. W. Mitchell, J. Phys. Chem. 66, 2359 (1962).
2. J. W. Mitchell, J. Photogr. Sci. Eng. 26, 270 (1982).
3. H. Frieser and E. Ranz, Ber. Bunsenges. Phys. Chem. 68, 389 (1964).
4. M. Ridgeway and P. Hillson, J. Photogr. Sci. Eng. 23, 133 (1980).
5. D. Cash, J. Photogr. Sci. 20, 19 (1972).
6. D. Cash, J. Photogr. Sci. 20, 223 (1972).
7. D. Corbin, A. Gingello, G. Maclntyre and B. H. Caroll, Photogr. Sci. Eng. 24, 45 (1980).
8. M. Van Doorselaer, J. Photogr. Sci. 35, 42 (1987).
9. H. Kanzaki and Y. Tadakuma, Phys. Chem. Solids 55, 631 (1994).
10. J. E. Keevert and V. V. Gokhale, J. Imag. Sci. 31, 243 (1987).
11. A. Hirano, Proc. of IS&T's 48th Annual Conference, IS&T, Springfield, VA, 1995, p. 199.
12. T. Tani, Photographic Sensitivity, Oxford University Press, New York, 1995. Chap. 6.
13. M. Van Doorselaer and E. Charlier, ICPS '98, KVCV, Leuven, Belgium, 1998, p. 267.
14. E. Charlier, R. Gijbels, M. Van Doorselaer, R. De Keyzer, D. Vandenbroucke, and I. Geuens, ICPS '98, KVCV, Leuven, Belgium, 1998, p. 455.
15. H. Takiguchi, J. Imag. Sci. 32, 20 (1988).
16. M. Van Doorselaer, J. Imag. Sci. Technol. 37, 524 (1993).
17. B. Shapiro, J. Imag. Sci. Technol. 43, 94 (1999).
18. G. Kortüm, Reflectance Spectroscopy, Springer Verlag, Berlin, 1969, pp.106-111.
19. W. Wendlandt and H. Hecht. Reflectance Spectroscopy, Interscience Publishers, New York, 196, pp. 46-62.
20. R. K. Hailstone and T. Zhao, Proc. of IS&T's 49th Annual Conference, IS&T, Springfield, VA, 1996, p. 219.
21. S. Ehrlich, J. Imag. Sci. Technol. 37, 73 (1993).
22. S. Ehrlich, Photogr. Sci. Eng. 23, 348 (1979).
23. D. F. Shiao, M. T. Nieh and A. H. Herz, J. Photogr. Sci. 30, 208 (1982).
24. T. Tani, M. Saito, Photogr. Sci. Eng. 23, 323 (1979).
25. R. L. Klaus, in International Symposium on Silver Halide Imaging, IS&T, Springfield, VA, 1997, p. 99.
26. D. L. Smith and H. R. Luss, Photogr. Sci. Eng. 20, 184 (1976).
27. L. M. Kellogg, in International Symposium on Silver Halide Imaging, IS&T, Springfield, VA, 1997, p. 150.
28. J. Van Biesen, J. Appl. Phys. 41, 1910 (1970).
29. T. Tani, J. Imaging Sci. Technol. 39, 386 (1995).
30. Y. Yosida, H. Mifune and T. Tani, J. Soc. Photogr. Sci. Technol. Jp. 59, 541 (1996).