Linewidth measurement intercomparison on a BESOI sample

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 84-95

  Villarrubia, J S ^a   Vladar, A E ^a   Lowney, J R ^a   Postek, M T ^a   Allen, R A ^a   Cresswell, M W ^a   Ghoshtagore, R N ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MODELS;

BONDED AND ETCHED-BACK SILICON ON INSULATOR (BESOI); ELECTRICAL CRITICAL DIMENSION (ECD);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033705460     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)