New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 379-389

  Boher, Pierre ^a   Piel, Jean Philippe ^a   Evrard, Patrick ^a   Defranoux, Christophe ^a   Espinosa, Marta ^a   Stehle, Jean Louis ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ELLIPSOMETRY; MONOCHROMATORS; MULTILAYERS; OXYGEN; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; WATER;

SPECTROSCOPIC ELLIPSOMETRY;

PHOTOLITHOGRAPHY;

EID: 0033705456     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)