Experiments and analyses of SiC thin film deposition from organo-silicon by a remote plasma method

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 287-291

  Hatanaka, Y ^a   Sano, K ^b   Aoki, T ^a   Wrobel, A M ^c  

^a SHIZUOKA UNIVERSITY   (Japan)

^b SUZUKI MOTOR CORPORATION   (Japan)

^c POLISH ACADEMY OF SCIENCES   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; BOND STRENGTH (CHEMICAL); ELECTRON CYCLOTRON RESONANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ORGANOMETALLICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

HYDROGEN RADICALS; ORGANO SILICON; RADICAL TRANSPORTATION TUBE; SCRATCH RESISTIVITY; ULTRAVIOLET DEGRADATION RESISTIVITY;

THIN FILMS;

EID: 0033705311     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00784-7     Document Type: Article

References (9)

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