Computer modeling of charging induced electron beam deflection in electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 239-246

  Hwu, Justin J ^a   Ko, Yeong Uk ^a   Joy, David C ^a  

^a UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER AIDED ANALYSIS; COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRIC CHARGE; ELECTRIC FIELD EFFECTS; ERROR ANALYSIS; SECONDARY EMISSION;

SOFTWARE PACKAGE MATHEMATICA; SOFTWARE PACKAGE SIMION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033704439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)